Nanotechnology

"Unter Nanotechnologie wird der Aufbau, die Analyse und die Anwendung von funktionalen Strukturen, Molekülen oder auch inneren und Grenzflächen verstanden, die sich im Größenmaßstab unterhalb 100 Nanometer bewegen. Gleichzeitig müssen die Strukturen neue Funktionen oder Eigenschaften besitzen, die unmittelbar an die Größenskala gekoppelt sind und so in der Makrowelt nicht realisierbar wären."

Research in the field of nanotechnology focuses on the development and understanding of future information technologies. For this purpose, our institute possesses all fabrication facilities required for the realization and characterization of silicon-based nano-structures and devices. Several manufacturing approaches have been developed in recent years:

• Nanolithography (EBL, AFM/STM, step and repeat NIL)
• Low-temperature deposition of dielectric, semiconductor and metal layers
• Doping by ion implantation
• Dry etching processes for pattern transfer
• Selforganized nanostructuring of magnetic thin films and III-V compounds by sputtering and low-pressure chemical vapour deposition (LPCVD)

Our expertise in this area is described on the following pages on this site. We are participating currently in several national and international projects and are always interested in starting collaborations with other research groups.