Electronic Structure Shift of Deeply Nanoscale Silicon by SiO 2 versus Si 3 N 4 Embedding as an Alternative to Impurity Doping

College Park, Md. [u.a.] / American Physical Society (2019) [Journal Article]

Physical review applied
Volume: 12
Issue: 5
Page(s): 054050

Authors

Selected Authors

König, Dirk
Wilck, Noel
Hiller, Daniel
Berghoff, Birger Veit
Meledin, Alexander

Other Authors

Di Santo, Giovanni
Petaccia, Luca
Mayer, Joachim
Smith, Sean
Knoch, Joachim

Identifier